The RIE-800iPB was used to form a 450 μm deep pillar with a 30 μm square pattern. It is processed from top to bottom without any film peeling.
Photo courtesy of Taiwan university
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Processes450 μm deep pillar formation
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The RIE-800iPB was used to form a 450 μm deep pillar with a 30 μm square pattern. It is processed from top to bottom without any film peeling.
Photo courtesy of Taiwan university